Electron beam guns/E-beam guns

In E-beam (E-gun) evaporation deposition, an electron beam generated by an electron beam gun is used to bombard the material. When the material is melted, and then evaporated to adhere to the substrate. Most of the early vapor deposition uses thermal evaporation, but the material and the crucible are in direct contact with the heating source. Materials that can be vapor-deposited are limited in that way. The amount of material consumed is large, and the purity of films is also insufficient. E-beam evaporation can effectively improve the limitation of thermal evaporation. It converts the kinetic energy of a high-energy electron beam into thermal energy to melt materials. E-beam evaporation can also accurately control the evaporation rate, and there are fewer restrictions on the choice of material types. Most materials can be evaporated except for some compounds and alloys.



During the process, it is necessary to pay attention to the magnetic field setting of the electron gun. If the magnetic field is set incorrectly, not only the E-beam fails to hit the material, but it may even be biased to the crucible. Eventually, the crucible will get damage and the coating is not effective.

Sunda Optical provides a full range of major brands’ electron beam guns, such as ULVAC, TELEMARK, TEMESCAL, JOEL and PLASMATECH...etc. In addition, internal parts of the electronic beam guns are also for sale. If you have any questions, please feel free to call us or leave a message to us.